Si

Silicon crystal growing machine (per Czochralski method)

Silicon crystal growing machine (per Czochralski method)

Equipment for growing silicon crystals by the Czochralski methodApplication: to be used in automated production(except for things of silicon monocrystal substrate 250 mm diameter and total length of 1600 mm per Czochralski method using ø 508 mm crucible

Diameter of crystal, mm, not to exceed

250

Length of crystal, mm, not to exceed

1600

Seed transferspeed, mm/min

0.1 - 8.0

Seed rotation speed, rpm/min

1.0- 30.0

Accuracy for maintaining transfer speed and rotation frequency of seed, %

> ±1

Crucible operating stroke, mm

400

Crucibletransferspeed, mm/min

0.01- 2.0

Crucible rotation frequency, rpm/min

1.0- 20.0

Crucible diameter, mm

508

Ultimate residual pressure, mmHg

5*10-3

Maximal pumping speed, l/s

150

Cooling water flowrate, m3/h

10

Cooling water input pressure, MPa, no less

0,3

Argon flow rate, l/h, not to exceed

3600

Recommended gas system inlet pressure, М

0,25

Recommended compressed air pressure, MPa

0.6

Compressed air flow rate per process, m3, not to exceed

0.1

Power:

Voltage,W

Frequency, Hz

3*380+N

50

Maximal heater power, kw

150

Heater supply voltage, V

0 - 60

Overall dimensions, mm

4000*2700*6200

Mass, kg

6000

Documents

Ordering products/services