OOO NPO GKMP produces vacuum coating equipment of mainly resistive and magnetron types. By prior agreement with the customer, it is possible to produce sputtering vacuum equipment with electron beam evaporation. Owing to its own production of heating elements, magnetrons, vacuum chambers, hermetic inlets, transport boxes, force transfer mechanisms and other high-tech elements, the customer is able to obtain a sputtering vacuum equipment of the configuration he needs.
Advantages of plants manufactured by NPO GKMP LLC:
- lack of a model range, individual production;
- variety;
- the possibility of double-sided coating with filament in a small volume;
- the ability to create hybrid installation;
- selection of main components in coordination with the customer;
- production on the territory of the Russian Federation;
- unique production culture;
- original manufacturer's warranty.
Scope: the main processes in the production of modern electronic microcircuits, capacitors, semiconductor elements, vacuum devices, applying a protective coating to a metalworking tool, applying an anti-friction coating to machine parts, medicine, decorative coatings, etc.
Coating equipment
Modern technological processes require modern high-tech solutions. So, in order to create unique materials, in one of the enterprises of the aerospace industry with the participation of leading specialists from a number of domestic enterprises, in 1995 a modern installation for coating MAP-1 was created. Subsequently, this equipment was subjected to repeated modernization, which led to the creation of modifications MAP-2 and MAP-3.
NPO “GKMP” has been a manufacturer of such equipment since 2012. Based on the existing experience in the manufacture of vacuum chambers,vacuum components and covable mechanism , hermetic inlets, pumping systems, we can safely say that at the moment it is possible to manufacture coating systems in vacuum of almost any configuration required by the customer. Own high-tech production, a vacuum laboratory equipped with modern equipment, as well as experience in design developments in this direction allow us to create the required installation in a fairly short time without overstating the cost of the finished equipment.
If necessary, it is possible to create an installation with box loading. This installation ensures the continuous presence of products in a vacuum, and loading and unloading occurs using separately sealed lock boxes. Thus, it is possible to obtain a production line with a continuous process of coating on substrates.
|
Parameter name |
Value |
|
Number of chambers in the installation: |
1 |
|
Form of the chamber |
cylindrical, rectangular |
|
Dimensions of the working area of the chamber: |
300...1500 500...2000 |
|
Substrate heating temperature, оС: |
50...400 |
|
Material Spraying Method: |
resistive heating, electron beam heating, ion-plasma magnetron sputtering |
|
Substrate materials: |
metals, alloys, ceramics, glass, single crystal plates |
|
Coating materials |
metals, alloys, nitrides, two-component compounds |
|
The thickness of the coating, microns: |
0,001...500 (determined by technology) |
|
Possibility of vacuum cleaning by glow discharge: |
yes |
|
Possibility of sequential sputtering of several coatings in one process: |
yes |
|
Types of pumping systems used: |
oil (rotary vane + diffusion pumps), oil-free (dry scroll + turbomolecular pumps) |
|
Types of sensors for monitoring the thickness of the coating: |
vibrational, quartz, optical (photometric), resistive, capacitive, combined |
|
Substrates location in the chamber: |
liberally, determined by the process technology |
|
Possibility of carousel processing of substrates: |
yes |
|
Possibility of double-sided application: |
yes |
UVN-71, UVN-74 type coating equipment
During the Soviet Union, for its own needs of the electronic, aerospace, and nuclear industries, many facilities of the type UVN-71 (cylindrical chamber with vertical lifting of the bell), UVN-74 (cylindrical horizontal chamber with an opening round flange door), RE-70, VU- 1, VU-2, Oratorio (a chamber with a rectangular flanged door), etc. Despite the fact that these installations are morally (and often physically) outdated, many of them are used in modern production, and taking into account well-established technological processes, the transition to modern equipment will require huge investments and will take a lot of time.
NPO “GKMP” proposes the creation of similar installations with the overall characteristics of the chamber and subcapillary equipment, completely identical to the existing ones, but equipped with the latest automated control system, pumping vacuum system, and a control system for the spraying process parameters. These equipment will replace existing process technology without the need for changes, and the modern components and materials used will increase the service life and simplify maintenance and maintainability. It is also possible to deeply upgrade existing installations, during which only those systems will be changed, the replacement of which is in demand by the customer.
|
Parameter name |
Value |
|
Number of chambers in the installation: |
1 |
|
Form of the chamber |
cylindrical |
|
Dimensions of the working area of the chamber: |
150...600 200...1000 |
|
Substrate heating temperature, оС: |
50...400 |
|
Material Spraying Method: |
resistive heating, electron beam heating, ion-plasma magnetron sputtering |
|
Substrate materials: |
metals, alloys, ceramics, glass, single crystal plates |
|
Coating materials |
metals, alloys, nitrides, two-component compounds |
|
The thickness of the coating, microns: |
0,001...500 (определяется технологией) |
|
Possibility of vacuum cleaning by glow discharge: |
yes |
|
Possibility of sequential sputtering of several coatings in one process: |
yes |
|
Types of pumping systems used: |
oil (rotary vane + diffusion pumps), oil-free (dry scroll + turbomolecular pumps) |
|
Types of sensors for monitoring the thickness of the coating: |
vibrational, quartz, optical (photometric), resistive, capacitive, combined |
|
Substrates location in the chamber: |
vertical, horizontal |
|
Possibility of carousel processing of substrates: |
yes |
|
Possibility of double-sided application: |
yes |
|
Possibility to apply in a limited volume: |
yes |
Documents
